Amat P5000



APPLIED MATERIALS AMAT P5000 MARK II SYSTEM AMAT P5000 Mark II Hybrid System. Two MxP Etch Chambers, One PECVD Nitride Chamber. Phase III handling system. 28-line onboard gas panel. Integrated endpoint system with 2 monochromators. Currently configured for 100mm wafers. System is fully configurable to your specifications. Applied Materials P5000 CVD & Etch. Related Projects. Tegal 6500 HRe Dual Frequency Etch. Tegal 901ACS & 903ACS RF Diode Etch. Tegal 981ACS RF Diode.

Manufacturer
APPLIED MATERIALS (AMAT)
Model
P5000
Part Number
MXP
Description
P5000 MXP Equipment
Status
Available

AMAT Applied Materials 4347 A 5000 CVD Chamber 200mm Precision 5000 P5000 Used. AMAT Applied Materials P5000 THROTTLE VALVE P/N 0010-09019W REV M. Similar sponsored items Feedback on our suggestions - Similar sponsored items. OVEN/CHAMBER (PLASMA ETCH MFG.) $3,000.00 + shipping. Amat 5500 endura, 300mm Factory interface.

ConditionQuantityCountry
Used1.0US
Used1.0US
Used1.0US
Used1.0US
Used0.0KR
Used1.0US
Unknown1.0US
Unknown1.0US
Unknown1.0US
Unknown1.0US
Unknown1.0US
Unknown3.0US
Unknown1.0US
HARNESS ASSY, SMIF POD DETECT/OTF SPLIT
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HOUSING, SPINDLE, SPINDLE ASSEMBLY
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Amat p5000 parts

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Amat P5000
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Amat P5000 Process

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P5000
  • CH-A: dual frequency lamp heated TEOS, oxide
    deposition chamber, doped and
    undoped,
    plasma enhanced with RF
    generator 350-450C
    range

  • CH-B: DxZ Nitride, DxZ style chamber, Nitride and
    silicon deposition typically 250-
    480 C deposition,
    plasma enhanced with
    Compact 2KW RF
    generator

  • CH-C: SiC, DxZ chamber, Silicon carbide and
    carbon deposition chamber, 250-480C
    range,
    plasma enhanced with compact 2KW
    RF
    generator

  • Gas panel: P5000 gas panel with TEOS hot box
  • Remote rack; AC remote rack with AMAT 1 style
    heat exchanger, 65C heat range

  • Vacuum pumps (4) CH-A, CH-B, CH-C and load-
    lock